LIANG Yunpeng ¹, CAO Shiyi ², WANG Junfeng ², WANG Qimin ¹, DAI Wei ¹
(1. Guangdong University of Technology, Guangzhou 510006, Guangdong, China; 2. Guangdong Dtech Technology Co., Ltd, Dongguan 523900, Guangdong, China)

Abstract: TiSiN coating was deposited by using pulsed arc deposition technology, whereas the influence of deposition parameters, including back bias voltage, target current and pulse width, on structure and performance of the coatings was studied. The composition, structure, mechanical properties and bonding strength of the coatings were characterized by using electron spectrometer, X-ray diffractometer, nanoindenter and scratcher. It was found that the increase in back bias voltage resulted in increase in the internal stress, surface etching resistance and surface roughness, while the hardness of the coating was decreased. Meanwhile, an increase in the target current accelerated the deposition rate. As the particle size was increased, the surface roughness was increased. With decreasing pulse width, the internal stress of the coating was reduced, and the coating hardness was increased up to 40 GPa and the adhesion was enhanced. By optimizing the pulse arc deposition parameters, using a suitable low back bias voltage, low pulse width and low target arc, TiSiN coatings, with high hardness, low stress, strong bonding and smooth surface, can be obtained.
Key words: multi-arc ion plating; TiSiN coating; back bias voltage; coating hardness; coating adhesion